We report a wavelength tunable electro-absorption modulated DBR laser based on a combined method of SAG and QWI. The threshold current is 37mA and the output power at 100mA gain current is 3.5mW. When coupled to a single-mode fiber with a coupling efficiency of 15% ,more than a 20dB extinction ratio is observed over the change of EAM bias from 0 to -2V. The 4.4nm continuous wavelength tuning range covers 6 channels on a 100GHz grid for WDM telecommunications.
An integratable distributed Bragg reflector laser is fabricated by low energy ion implantation induced quantum well intermixing.A 4 6nm quasi continuous wavelength tuning range is achieved by controlling phase current and grating current simultaneously,and side mode suppression ratio maintains over 30dB throughout the tuning range except a few mode jump points.
A semiconductor optical amplifier gate based on tensile strained quasi bulk InGaAs is developed.At injection current of 80mA,a 3dB optical bandwidth of more than 85nm is achieved due to dominant band filling effect.Moreover,the most important is that very low polarization dependence of gain (<0 7dB),fiber to fiber lossless operation current (70～90mA) and a high extinction ratio (>50dB) are simultaneously obtained over this wide 3dB optical bandwidth (1520～1609nm) which nearly covers the spectral region of the whole C band (1525～1565nm) and the whole L band (1570～1610nm).The gating time is also improved by decreasing carrier lifetime.The wide band polarization insensitive SOA gate is promising for use in future dense wavelength division multiplexing (DWDM) communication systems.
Monolithic electro absorption modulated distributed feedback(DFB) lasers are proposed and fabricated by using a modified double stack active layer.The 38mA threshold,9dB extinction ratio (from 0 5V to 3 0V),and about 5mW output power at the 100mA operation current are achieved.Compared with other reported results (only 1 5mW at the same operation current) of the traditional stack active structure,the proposed structure improves the output power of devices.
报道了窄条宽选区生长有机金属化学气相沉积 (NSAG- MOCVD)成功生长的 In P系材料 ,并提出在 NSAG-MOCVD生长研究中 ,引入填充因子的必要性 ,给出速率增强因子随填充因子变化的经验公式 ,计算得出速率增强因子随填充因子的变化关系 .与实验结果作了比较 ,发现 In P的速率增强因子主要取决于掩膜宽度 ,In Ga As P的速率增强因子不仅与掩膜宽度有关 ,同时也依赖于生长厚度 。
